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 Eclipse L200

Eclipse L200

L200:
Offers 200mm wafer and mask inspection capabilities for reflected light illumination defect identification with various observation methods such as brightfield, darkfield, simple polarizing and DIC.

L200ND:
Offers 200mm wafer and mask inspection capabilities for both transmitted and relfected light illumination. In addition to the observation methods of the L200N, epi-fluorescence observations including 365nm UV exicitation is possible.

L200A:
Automated version of the L200N. Frequently used operations such as aperture control, focusing, brightfield/darkfield changeover, nosepiece rotation, lamp intensity control, and DIC settings are all motorized and can be controlled by the remote controller or a PC.

Eclipse L200

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